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High-Temperature Performance of MoS2 Thin-Film Transistors: DC and Pulse Current-Voltage Characteristics

机译:mos2薄膜晶体管的高温性能:直流和脉冲   电流 - 电压特性

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摘要

The measurements of the high - temperature current - voltage characteristicsof MoS2 thin - film transistors show that the devices remain functional totemperatures of at least as high as 500 K. The temperature increase results indecreased threshold voltage and mobility. The comparison of the DC and pulsemeasurements shows that the DC sub - linear and super - linear outputcharacteristics of MoS2 thin - films devices result from the Joule heating andthe interplay of the threshold voltage and mobility temperature dependences. Attemperatures above 450 K, an intriguing phenomenon of the "memory step" - akink in the drain current - occurs at zero gate voltage irrespective of thethreshold voltage value. The memory step effect was attributed to the slowrelaxation processes in thin films similar to those in graphene and electronglasses. The obtained results suggest new applications for MoS2 thin - filmtransistors in extreme - temperature electronics and sensors.
机译:对MoS2薄膜晶体管的高温电流-电压特性的测量表明,该器件在至少高达500 K的温度下仍可正常工作。温度升高导致阈值电压和迁移率降低。直流测量和脉冲测量的比较表明,MoS2薄膜器件的直流亚线性和超线性输出特性是由于焦耳热以及阈值电压和迁移率温度依赖性的相互作用而产生的。在高于450 K的温度下,无论阈值电压值如何,在零栅极电压下都会发生“记忆阶跃”的有趣现象-漏极电流类似。记忆阶梯效应归因于薄膜中的慢弛豫过程,类似于石墨烯和电子玻璃中的薄膜。获得的结果表明MoS2薄膜晶体管在极端温度电子设备和传感器中的新应用。

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